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多孔MoS2/g-C3N4材料对水环境中四环素的降解

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刘阳, 高生旺, 王丽君, 朱建超, 高红, 夏训峰. 多孔MoS2/g-C3N4材料对水环境中四环素的降解[J]. 环境工程学报, 2019, 13(4): 818-825. doi: 10.12030/j.cjee.201809155
引用本文: 刘阳, 高生旺, 王丽君, 朱建超, 高红, 夏训峰. 多孔MoS2/g-C3N4材料对水环境中四环素的降解[J]. 环境工程学报, 2019, 13(4): 818-825. doi: 10.12030/j.cjee.201809155
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LIU Yang, GAO Shengwang, WANG Lijun, ZHU Jianchao, GAO Hong, XIA Xunfeng. Tetracycline degradation in aqueous solution by porous MoS2/g-C3N4[J]. Chinese Journal of Environmental Engineering, 2019, 13(4): 818-825. doi: 10.12030/j.cjee.201809155
Citation: LIU Yang, GAO Shengwang, WANG Lijun, ZHU Jianchao, GAO Hong, XIA Xunfeng. Tetracycline degradation in aqueous solution by porous MoS2/g-C3N4[J]. Chinese Journal of Environmental Engineering, 2019, 13(4): 818-825. doi: 10.12030/j.cjee.201809155
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多孔MoS2/g-C3N4材料对水环境中四环素的降解

  • 1.

    昆明理工大学建筑工程学院，昆明 650500

  • 2.

    中国环境科学研究院，北京 100012

  • 基金项目:

    国家科技支撑计划课题2014BAL02B02国家科技支撑计划课题(2014BAL02B02)

Tetracycline degradation in aqueous solution by porous MoS2/g-C3N4

  • 1.

    Faculty of Civil Engineering and Architectural, Kunming University of Science and Technology, Kunming 650500, China

  • 2.

    Chinese Research Academy of Environmental Sciences, Beijing 100012, China

  • Fund Project:

  • 摘要: 通过浸渍-高温煅烧法制备多孔MoS2/g-C3N4光催化剂，采用X射线衍射(XRD)、透射电子显微镜(TEM)、扫描电子显微镜(SEM)、N2吸附-解吸、紫外-可见光(UV-vis)漫反射吸收光谱对材料进行表征；并在可见光照射下，对四环素(TC)进行光催化降解。结果表明，催化剂量为2.0 g·L-1、pH为5.0时，对TC的去除效果最好，可见光照射180 min，MoS2/g-C3N4(1.0%-MC)复合材料对TC的降解率可达80.6%。反应完成后，复合材料循环利用5次，其降解效率仍保持在70.0%以上。浸渍-高温煅烧法所制备的MoS2/g-C3N4光催化剂具有良好的应用前景。
    Abstract: The unique porous MoS2/g-C3N4 heterojunction photocatalyst was successfully constructed by a facile impregnation and calcination method. The obtained MoS2/g-C3N4 composites were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), N2 adsorption-desorption, and ultraviolet-visible (UV-vis) diffuse reflection spectroscopy. Then it was used to photocatalytic degrade tetracycline (TC) under visible light irradiation. The results showed that the optimum TC degradation effect was achieved at MoS2/g-C3N4(1.0%-MC) dosage of 2.0 g·L -1 and pH 5.0. After 180 min visible light irradiation, the removal rate of TC reached 80.6%. The used MoS2/g-C3N4 could be recycled for 5 times, and its degradation rate for TC maintained above 70.0%. The MoS2/g-C3N4 composites prepared by facile impregnation and calcination method have a good application prospect.
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  • 刊出日期:  2019-04-15

多孔MoS2/g-C3N4材料对水环境中四环素的降解

  • 1. 昆明理工大学建筑工程学院，昆明 650500
  • 2. 中国环境科学研究院，北京 100012
基金项目:

国家科技支撑计划课题2014BAL02B02国家科技支撑计划课题(2014BAL02B02)

摘要: 通过浸渍-高温煅烧法制备多孔MoS2/g-C3N4光催化剂，采用X射线衍射(XRD)、透射电子显微镜(TEM)、扫描电子显微镜(SEM)、N2吸附-解吸、紫外-可见光(UV-vis)漫反射吸收光谱对材料进行表征；并在可见光照射下，对四环素(TC)进行光催化降解。结果表明，催化剂量为2.0 g·L-1、pH为5.0时，对TC的去除效果最好，可见光照射180 min，MoS2/g-C3N4(1.0%-MC)复合材料对TC的降解率可达80.6%。反应完成后，复合材料循环利用5次，其降解效率仍保持在70.0%以上。浸渍-高温煅烧法所制备的MoS2/g-C3N4光催化剂具有良好的应用前景。

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